Spatter Sourceのメーカーや取扱い企業、製品情報、参考価格、ランキングをまとめています。
イプロスは、 製造業 ・ BtoB における情報を集めた国内最大級の技術データベースサイトです。

Spatter Source - メーカー・企業と製品の一覧

Spatter Sourceの製品一覧

1～4 件を表示 ／ 全 4 件

表示件数
IONIX® Magnetron Sputter Source

IONIX® Magnetron Sputter Source

The unique cooling water pathway allows the entire magnetron to be cooled at a constant temperature at all times.

We handle the rectangular type 'IONIX® Magnetron Sputter Source'. It can be installed both internally and externally. Thanks to its unique cooling water pathway, the entire magnetron can be cooled to a constant temperature at all times. Additionally, it supports KF, ISO, and CF connections, and with its unique magnetic pole arrangement, it is compatible with the UMBS configuration. 【Features】 ■ Constant temperature cooling for the entire unit ■ Installable both internally and externally ■ Supports KF, ISO, and CF connections ■ Compatible with UMBS configuration due to unique magnetic pole arrangement ■ Cooling structure that does not put stress on the target, preventing deformation of the target *For more details, please refer to the PDF document or feel free to contact us.

  • Cooling system

ブックマークに追加いたしました

ブックマーク一覧

ブックマークを削除いたしました

ブックマーク一覧

これ以上ブックマークできません

会員登録すると、ブックマークできる件数が増えて、ラベルをつけて整理することもできます

無料会員登録
Sputter Source "Ultra High Vacuum Compatible Magnetron RF Sputter Source"

Sputter Source "Ultra High Vacuum Compatible Magnetron RF Sputter Source"

It is possible to remove the magnet while maintaining the spatter source in ultra-high vacuum.

The "Ultra High Vacuum Compatible Magnetron RF Sputter Source" is a general-purpose compact magnetron sputter source compatible with ultra high vacuum. Since the entire body is bakeable, it enables film deposition with minimal impurities even with highly reactive targets. 【Features】 - Ultra high vacuum type that does not use O-rings - The magnet can be removed while maintaining the sputter source in ultra high vacuum - Baking up to 300°C is possible by removing the magnet - Target fixation is done with a retainer, allowing for quick target replacement - The gas inlet is integrated with the mounting flange, eliminating the need for a separate flange for gas introduction For more details, please contact us or download the catalog.

  • others

ブックマークに追加いたしました

ブックマーク一覧

ブックマークを削除いたしました

ブックマーク一覧

これ以上ブックマークできません

会員登録すると、ブックマークできる件数が増えて、ラベルをつけて整理することもできます

無料会員登録
Sputter Source "Ultra High Vacuum Compatible Magnetron Sputter Source"

Sputter Source "Ultra High Vacuum Compatible Magnetron Sputter Source"

By removing the magnet, baking up to 300°C is possible.

This sputter source is a general-purpose compact magnetron sputter source compatible with ultra-high vacuum. Since the entire body is bakeable, it allows for film deposition with minimal impurities even with highly reactive targets. 【Features】 - Ultra-high vacuum type without O-rings - The magnet can be removed while maintaining the sputter source in ultra-high vacuum - Baking up to 300°C is possible by removing the magnet - The target is fixed with a retainer, allowing for quick replacement of the target - The gas inlet is integrated with the mounting flange, so a separate flange for gas introduction is unnecessary For more details, please contact us or download the catalog.

  • Vacuum Equipment

ブックマークに追加いたしました

ブックマーク一覧

ブックマークを削除いたしました

ブックマーク一覧

これ以上ブックマークできません

会員登録すると、ブックマークできる件数が増えて、ラベルをつけて整理することもできます

無料会員登録
Sputter Source "Ultra High Vacuum Compatible Magnetron DC Sputter Source"

Sputter Source "Ultra High Vacuum Compatible Magnetron DC Sputter Source"

It is possible to remove the magnet while maintaining the spatter source in ultra-high vacuum.

This sputter source is a general-purpose compact magnetron sputter source compatible with ultra-high vacuum. Since the entire body is bakeable, it allows for film formation with minimal impurities even with highly reactive targets. 【Features】 - Ultra-high vacuum type that does not use O-rings - The magnet can be removed while maintaining the sputter source in ultra-high vacuum - Baking up to 300°C is possible by removing the magnet - The target is fixed with a retainer, allowing for quick replacement of the target - The gas inlet is integrated with the mounting flange, eliminating the need for a separate flange for gas introduction For more details, please contact us or download the catalog.

  • others

ブックマークに追加いたしました

ブックマーク一覧

ブックマークを削除いたしました

ブックマーク一覧

これ以上ブックマークできません

会員登録すると、ブックマークできる件数が増えて、ラベルをつけて整理することもできます

無料会員登録
COPYRIGHT © 2001-2025 IPROS CORPORATION ALL RIGHTS RESERVED.