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Spatter Source - List of Manufacturers, Suppliers, Companies and Products

Spatter Source Product List

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IONIX® Magnetron Sputter Source

IONIX® Magnetron Sputter Source

The unique cooling water pathway allows the entire magnetron to be cooled at a constant temperature at all times.

We handle the rectangular type 'IONIX® Magnetron Sputter Source'. It can be installed both internally and externally. Thanks to its unique cooling water pathway, the entire magnetron can be cooled to a constant temperature at all times. Additionally, it supports KF, ISO, and CF connections, and with its unique magnetic pole arrangement, it is compatible with the UMBS configuration. 【Features】 ■ Constant temperature cooling for the entire unit ■ Installable both internally and externally ■ Supports KF, ISO, and CF connections ■ Compatible with UMBS configuration due to unique magnetic pole arrangement ■ Cooling structure that does not put stress on the target, preventing deformation of the target *For more details, please refer to the PDF document or feel free to contact us.

  • Cooling system

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Sputter Source "Ultra High Vacuum Compatible Magnetron RF Sputter Source"

Sputter Source "Ultra High Vacuum Compatible Magnetron RF Sputter Source"

It is possible to remove the magnet while maintaining the spatter source in ultra-high vacuum.

The "Ultra High Vacuum Compatible Magnetron RF Sputter Source" is a general-purpose compact magnetron sputter source compatible with ultra high vacuum. Since the entire body is bakeable, it enables film deposition with minimal impurities even with highly reactive targets. 【Features】 - Ultra high vacuum type that does not use O-rings - The magnet can be removed while maintaining the sputter source in ultra high vacuum - Baking up to 300°C is possible by removing the magnet - Target fixation is done with a retainer, allowing for quick target replacement - The gas inlet is integrated with the mounting flange, eliminating the need for a separate flange for gas introduction For more details, please contact us or download the catalog.

  • others

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Sputter Source "Ultra High Vacuum Compatible Magnetron Sputter Source"

Sputter Source "Ultra High Vacuum Compatible Magnetron Sputter Source"

By removing the magnet, baking up to 300°C is possible.

This sputter source is a general-purpose compact magnetron sputter source compatible with ultra-high vacuum. Since the entire body is bakeable, it allows for film deposition with minimal impurities even with highly reactive targets. 【Features】 - Ultra-high vacuum type without O-rings - The magnet can be removed while maintaining the sputter source in ultra-high vacuum - Baking up to 300°C is possible by removing the magnet - The target is fixed with a retainer, allowing for quick replacement of the target - The gas inlet is integrated with the mounting flange, so a separate flange for gas introduction is unnecessary For more details, please contact us or download the catalog.

  • Vacuum Equipment

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Sputter Source "Ultra High Vacuum Compatible Magnetron DC Sputter Source"

Sputter Source "Ultra High Vacuum Compatible Magnetron DC Sputter Source"

It is possible to remove the magnet while maintaining the spatter source in ultra-high vacuum.

This sputter source is a general-purpose compact magnetron sputter source compatible with ultra-high vacuum. Since the entire body is bakeable, it allows for film formation with minimal impurities even with highly reactive targets. 【Features】 - Ultra-high vacuum type that does not use O-rings - The magnet can be removed while maintaining the sputter source in ultra-high vacuum - Baking up to 300°C is possible by removing the magnet - The target is fixed with a retainer, allowing for quick replacement of the target - The gas inlet is integrated with the mounting flange, eliminating the need for a separate flange for gas introduction For more details, please contact us or download the catalog.

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